发明名称 HIGH PURITY ZIRCONIUM OR HAFNIUM, SPUTTERING TARGET COMPRISING THE HIGH PURITY ZIRCONIUM OR HAFNIUM AND THIN FILM FORMED USING THE TARGET, AND METHOD FOR PRODUCING HIGH PURITY ZIRCONIUM OR HAFNIUM AND METHOD FOR PRODUCING POWDER OF HIGH PURITY ZIRCONIUM OR HAFNIUM
摘要 <p>A high purity zirconium or hafnium which is extremely reduced in the contents of an alkali metal such as Na or K, a radioactive element such as U or Th, a transition metal or heavy metal or high melting point metal such as Fe, Ni, Co, Cr, Cu, Mo, Ta or V, and a gas forming element such as C or O; and a method for producing a high purity zirconium or hafnium which allows the production thereof at a low cost; and a method for producing a powder of high purity zirconium or hafnium with safety and at a low cost which comprises using a hydrogenated high purity zirconium or hafnium as a material. The high purity zirconium or hafnium is greatly reduced in the contents of impurities which are obstacles to assurance of operational functions of a semiconductor.</p>
申请公布号 WO2002029125(P1) 申请公布日期 2002.04.11
申请号 JP2001005612 申请日期 2001.06.29
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