| 摘要 |
<p>PROBLEM TO BE SOLVED: To use a small number of photo masks to manufacture a liquid crystal display device having a high numerical aperture. SOLUTION: A transparent conductive film 2 and a gate metal film 3 are successively formed on a glass substrate 1, and resist patterns 4 are applied. The resist patterns 4 uses one photo mask to change the thickness by halftone exposure, and the resist patterns for a pixel electrode and that for a gate electrode and a wiring pattern of a matrix circuit are collectively formed. The transparent conductive film 2 and the gate metal film 3 which are not covered with the resist patterns 4 are removed, and resist patterns 4 are removed in parts of pixel electrodes 2a as shown by (d), and remaining parts 4c are left in the other parts. The gate metal film 3 is removed as shown by (e) and remaining parts 4c of the resist patterns 4 are removed as shown by (f) to form pixel electrodes 2a, gate electrodes 3a, etc.</p> |
