| 摘要 |
PROBLEM TO BE SOLVED: To provide an organic anti-reflective film which uses a specific polymer in a process for forming superfine patterns, can form the stable superfine patters, while removing the changes in standing waves and reflection due to the changes of the optical properties and photoresist thickness of a lower film layer on a wafer and the change in CD due to the lower film, and further can freely adjust the k value of the organic anti-reflective film as well as increase the yield of the product. SOLUTION: The organic anti-reflective polymer characterized by having a structure of the chemical formula [1]. The method for producing the polymer. The anti-reflective film composition containing the organic anti-reflective polymer, and the method for producing the anti-reflective film with the composition. |
