Adaptive X-ray lithography mask.

摘要

Provided is an apparatus for improving alignment accuracy by distorting in a controlled manner an X-ray lithographic mask 540' to compensate for mask distortions induced primarily by thermally induced clamping effects in E-beam and X-ray exposure systems. A system of additional alignment sensors X<Sub>1-4</Sub>, Y<Sub>1-4</Sub>, Z<Sub>1-4</Sub> is used to provide localized misalignment information. This information is then used to provide feedback to a servo system which in turn activates electromechanically translatable clamps 610-630 which distort the X-ray mask so as to minimize misalignment over the exposure field.