| 摘要 |
The invention relates to a method for fluorescent X-ray analysis of a sample, which sample includes: a substrate (5) containing a chemical element b; a thin layer (6) which is deposited on the substrate and contains the chemical element b and a chemical element a, which method includes the steps of: irradiating the sample by means of primary X-rays, detecting the intensity of X-ray lines of comparatively hard fluorescent X-rays and comparatively soft fluorescent X-rays, both produced in the sample due to irradiation by means of the primary X-rays, wherein one or more of the following combinations of the fluorescent X-ray lines of the chemical elements a and b are detected:b-L/b-K;b-K/a-L;b-L/a-L;b-L/a-M;a-M/a-La-M/a-Na-K/b-Ka-K/b-La-K/a-L;and the thickness of the thin layer (6) and/or the concentration of the first or the second chemical element are detected on the basis of the detected X-ray lines of the comparatively hard and the comparatively soft fluorescent X-rays.
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