发明名称 IN-PLANT FACILITY MONITORING SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To provide an in-plant facility monitoring system which can exactly judge and speedy take countermeasure without directly going to the site where an abnormal state has occurred. SOLUTION: When an abnormality in any one facility of plating liquid storage tank 31, plating bath 32 and plating plate dry conveyer device 33 is detected in a main control part 21, the image data of a video camera photographing the facility where the abnormal state occurs are transmitted to a portable telephone set 50 together with an abnormality occurrence signal and these image data are displayed on a display part 50A. Further, the input signal is converted into an operating signal processing part 23 on the input operation of the portable telephone set 50 and transmitted as an operating signal to the main control part 21.</p>
申请公布号 JP2002099325(A) 申请公布日期 2002.04.05
申请号 JP20000288398 申请日期 2000.09.22
申请人 IBIDEN CO LTD 发明人 MIYAZAWA YOSHIFUMI
分类号 H04N7/18;G05B23/02;G08B25/00;H04M11/00;H04Q9/00;(IPC1-7):G05B23/02 主分类号 H04N7/18
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