| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern quality inspection method and device capable of surely detecting the defect of a pattern such as character or mark formed by embossing or printing and precisely inspecting the quality of the pattern. SOLUTION: This method for inspecting the quality of the pattern such as character or mark formed by embossing or printing comprises an imaging process for taking the image of the pattern to obtain an image signal; a profile extracting process for processing the image signal to extract the profile of the pattern, a pixel counting process for counting the number of pixels forming the extracted profile; and a comparing process for comparing the pixel counted value with a reference profile pixel number in this pattern. The quality of the pattern is inspected on the basis of the comparison result in the comparing process. |
