| 摘要 |
PURPOSE: An apparatus for coating resist is provided to control constantly the amount of dispensed photoresist by installing a dispensing pump and a dispensing control valve in the last nozzle. CONSTITUTION: A dispensing pump(13) is used for determining the amount of dispensed photoresist in a photoresist dispensing process. An interception/counterflow prevention valve(14) is installed in the last nozzle(15). The dispensing pump(13) is connected with a chemical filter(12) through a photoresist pipe arrangement(18). The chemical filter(12) is connected with a photoresist vessel(11) through the photoresist pipe arrangement(18). The photoresist vessel(11) and the chemical filter(12) are located at a lower portion of a coater spin unit for coating the photoresist on a wafer(16). The dispensing pump(13) and the interception/counterflow prevention valve(14) are located on an upper portion of the coater spin unit.
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