Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elements

摘要

The photomask and the associated method of lithography and mask technique enable production of a regular configuration of resist dots or holes. At least one photomask is a phase mask. The method is useful for the production of magnetic memory components, in particular MRAM memories, having elliptically shaped magnetic memory elements of high density.