发明名称 Method and apparatus for magnetron sputtering
摘要 <p>An assembly for producing a magnetic field for use with a magnetron sputtering device, the device having a target with a front surface for sputtering and a back surface, the assembly comprising a plurality of magnets, each of the plurality of magnets having an energy product, a cross-section perpendicular to the back surface, and a north-south magnetic orientation, where the north-south magnetic orientation is substantially perpendicular to the back surface, where the plurality of magnets includes at least one stack of two or more magnets, where one or more of the at least one stack is adjacent to the back surface, and where the plurality of magnets cooperate to form a closed-loop magnetic tunnel adjacent to the front surface.</p>
申请公布号 EP1193729(A2) 申请公布日期 2002.04.03
申请号 EP20010308049 申请日期 2001.09.21
申请人 THE BOC GROUP, INC. 发明人 NEWCOMB, RICHARD LEE;CEELEN, HANS PETER THEODORUS
分类号 C23C14/35;H01J37/34;(IPC1-7):H01J37/34 主分类号 C23C14/35
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