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发明名称
CVD OF INTEGRATED Ta AND TaNx FILMS FROM TANTALUM HALIDE PRECURSORS
摘要
申请公布号
EP1192293(A1)
申请公布日期
2002.04.03
申请号
EP20000930148
申请日期
2000.04.25
申请人
TOKYO ELECTRON LIMITED
发明人
HAUTALA, JOHN, J.;WESTENDORP, JOHANNES, F., M.
分类号
C23C16/08;C23C16/34;H01L21/28;H01L21/285;H01L21/768;(IPC1-7):C23C16/34;C23C16/16
主分类号
C23C16/08
代理机构
代理人
主权项
地址
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