发明名称 |
Apparatus and method for contact failure inspection in semiconductor devices |
摘要 |
There is provided a contact failure inspection system and method for semiconductor devices and a method of manufacturing semiconductor devices. Using digitized values for electron signals detected using a scanning electron microscope, contacts can be inspected to identify failures such as non-open contact holes. The contact failure inspection is performed by comparing the electron signal value detected from a unit area including at least one contact hole with values representative of the electron signal corresponding to a normal contact.
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申请公布号 |
US6366688(B1) |
申请公布日期 |
2002.04.02 |
申请号 |
US19980162267 |
申请日期 |
1998.09.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUN CHUNG-SAM;KIM JEONG-KON;CHON SANG-MOON;CHOI SANG-BONG |
分类号 |
G01Q30/02;G01Q30/04;G01R31/28;(IPC1-7):G06K9/00 |
主分类号 |
G01Q30/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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