| 摘要 |
PROBLEM TO BE SOLVED: To solve such a problem that the temperature in conventional device for exposing master disk is influenced by the temperature of a room in which the device for exposing master disk is disposed because the conventional device has no temperature controlling mechanism, therefore, characteristics of a laser for exposure, respective optical holders, respective optical elements and respective controlling instruments, etc., are varied by the temperature change and the proper exposure processing is made unable. SOLUTION: This device and method for exposing original plate has a mechanism which controls the temperature of the laser for exposure, the respective optical holders, the respective optical elements and the respective controlling instruments, etc., or the whole of device for exposing master disk. The temperature controlling is performed by purging the temperature-controlled gas, by the temperature controlling means, and, therein, single gas such as N2 and argon or mixed gas containing one or more of the single gases is used as the purged gas. Otherwise, the temperature controlling means is preferably such a type one that the temperature controlling is performed by flowing the temperature-controlled liquid to respective places to be temperature- controlled. In such a manner, failure due to temperature variation is removed and making the effect possible the proper exposure processing is obtained.
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