| 摘要 |
PROBLEM TO BE SOLVED: To improve the technique for measuring registration for overlaying semiconductor layers. SOLUTION: At least 1st, 2nd, and 3rd layers are formed on top of another. A 1st pattern is provided at a prescribed position of the 1st layer. A 2nd pattern is provided at a prescribed position of the 2nd layer and has a specific shape and a specific size and further has at least one discontinuous part formed at a predetermined position. A 3rd pattern is provided at a prescribed position of the 3rd layer and has a specific shape and the specific size of the 2nd pattern, and further has at least one discontinuous part formed at its predetermined position; and the respective parts of the 2nd and 3rd patterns match with at least one discontinuous part of the other, when the 2nd and 3rd layers are registered. |
