发明名称 METHODS AND APPARATUS FOR MEASUREMENT AND CORRECTION OF OPTICAL ABERRATION
摘要 <p>The invention relates to methods and apparatus for determining a characteristic of an optical element. The apparatus includes a spatial light pattern generator adapted to generate a beam of light at a predetermined spatial position, at least one lenslet disposed in an array of lenslets adapted to receive the beam of light from the spatial light pattern generator, and to direct the beam of light to the optical element. The apparatus further includes a detector and the detector is adapted to detect a received spatial position at which the detector receives the beam of a processor. The invention further relates to methods and apparatus for generating a diffraction limited image. The apparatus includes a spatial light pattern generator adapted to generate a plurality of beams of light at selected positions compensate for a characteristic of an optical element and an array of lenslets adapted to receive the plurality of beams of light from the spatial light pattern generator and to direct the plurality of beams of light to the optical element.</p>
申请公布号 WO2002025347(A2) 申请公布日期 2002.03.28
申请号 US2001029067 申请日期 2001.09.18
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