SHOWER HEAD FOR FABRICATING SEMICONDUCTOR AND FABRICATING METHOD THEREOF

摘要

PURPOSE: A shower head for fabricating a semiconductor is provided to decrease the number of particles dropped to a wafer, by performing an embossing process regarding the surface of a spraying plate for spraying metallic gas so that the surface area where the metallic gas is attached is increased. CONSTITUTION: A shower head body has a buffer space part to which process gas is induced. A spraying plate(23) sprays the process gas in the buffer space part, installed on the bottom surface of the shower head body. The surface of the spraying plate becomes rough to increase the surface area to which the metallic gas is attached. The surface of the spraying plate is embossed.