| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material processing device which does not cause flaws, such as scratches and pushing flaws, on photosensitive materials when transporting the photosensitive materials. SOLUTION: This photosensitive material processing device 10 has a processing tank for processing the photosensitive materials 20, a circulating pump for circulating the processing liquid in this processing tank and filters 56 disposed on the processing liquid inflow side of the circulating pump. The filters 56 comprise an outer filter 56E and an inner filter 56I inserted into the outer filter 56E. The average grain size of the inner filter 56I is finer than that of the outer filter 56E. When the processing liquid is circulated by the circulating pump, large foreign matter is captured by the outer filter 56E and the foreign matter smaller than this foreign matter is captured by the inner filter 56I, respectively. Then, not only the surfaces of the filters but the inside thereof can be utilized as the capturing regions for the foreign matter. As a result, the small foreign matter can be captured and the resistance of liquid flow is hardly increased.
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