SEMICONDUCTOR WAFER CLEANING APPARATUS PREVENTING VORTEX IN CHAMBER

摘要

PURPOSE: A semiconductor wafer cleaning apparatus preventing vortex in a chamber is provided to efficiently prevent a vortex phenomenon in the upper portion of the wafer, by mounting an absorbing fan or a wafer mounting unit formed as one body with the absorbing fan while not replacing main parts constituting a conventional wafer cleaning apparatus. CONSTITUTION: A supply hole(3) for supplying air and an exhaust hole(19) for exhausting air are formed in a chamber(1). The wafer(11) put into the chamber is mounted on the wafer mounting unit(15). A rotating unit has a rotating axis(17) for rotating the wafer mounting unit. A chemical liquid spraying unit sprays chemical liquid from a portion over the wafer to the upper surface of the wafer. An absorbing unit absorbs air supplied through the supply hole to the inside of the chamber and exhausts air through the exhaust hole, installed in the chamber. The absorbing unit prevents vortex generated when air is supplied to the chamber.