发明名称 |
THIN FILM TRANSISTOR, ITS MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY DEVICE USING IT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a thin film transistor improved in performance and reliability by suppressing the OFF current (photoconductive current) when the channel region of the transistor is irradiated with light. SOLUTION: The thin film transistor has a polysilicon semiconductor layer on which a channel region and source and drain regions arranged on both sides of the channel region are formed. A depletion layer is formed between the channel region and drain region so that the width of the depletion layer may have a proportional relation with the photoconductive current which is generated when the channel region is irradiated with light. In order to suppress the photoconductive current to a prescribed allowable value or lower, the width of the depletion layer is adjusted to a value found based on the proportional relation or smaller.</p> |
申请公布号 |
JP2002083973(A) |
申请公布日期 |
2002.03.22 |
申请号 |
JP20000280673 |
申请日期 |
2000.09.14 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
MINAMINO YUTAKA;SENDA KOJI;OKADA TAKASHI;YAMANO ATSUHIRO |
分类号 |
G02F1/1335;G02F1/13357;G02F1/136;G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):H01L29/786;G02F1/133 |
主分类号 |
G02F1/1335 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|