发明名称 THIN FILM TRANSISTOR, ITS MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY DEVICE USING IT
摘要 <p>PROBLEM TO BE SOLVED: To provide a thin film transistor improved in performance and reliability by suppressing the OFF current (photoconductive current) when the channel region of the transistor is irradiated with light. SOLUTION: The thin film transistor has a polysilicon semiconductor layer on which a channel region and source and drain regions arranged on both sides of the channel region are formed. A depletion layer is formed between the channel region and drain region so that the width of the depletion layer may have a proportional relation with the photoconductive current which is generated when the channel region is irradiated with light. In order to suppress the photoconductive current to a prescribed allowable value or lower, the width of the depletion layer is adjusted to a value found based on the proportional relation or smaller.</p>
申请公布号 JP2002083973(A) 申请公布日期 2002.03.22
申请号 JP20000280673 申请日期 2000.09.14
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MINAMINO YUTAKA;SENDA KOJI;OKADA TAKASHI;YAMANO ATSUHIRO
分类号 G02F1/1335;G02F1/13357;G02F1/136;G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):H01L29/786;G02F1/133 主分类号 G02F1/1335
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