| 摘要 |
<p>A polishing pad and method, wherein surface dressing is made unnecessary, no deformation occurs with the lapse of working time, there is no clogging otherwise caused by abrasive grains or abraded chips, and the surface of a polish-object article can be made flat to a high degree. A polishing pad (10) formed by applying a cloth sheet to a base sheet. A polishing method comprising the steps of feeding a polishing liquid to the surface of the polishing pad (10) applied to a rotating surface plate (D) through a nozzle (N), and pressing a polish-object article (11) stuck to a rotating head (H) against the surface of the polishing pad (10).</p> |
