发明名称 |
Method of manufacturing a spacer used in an electron beam generating device, an electron beam generating device using the spacer and image-forming apparatus |
摘要 |
The present application discloses a method of manufacturing a spacer having an excellent characteristic, and more particularly a method of efficiently manufacturing the spacer. Specifically, in a method of manufacturing a spacer used in an electron beam generating device, there is provided a step of providing a material for forming a film on a film formation surface of a spacer base substance in a state where the spacer base substance is nipped, wherein the material providing step is achieved in a state where the film formation surface is not projected from an end portion of a nipping member for nipping the spacer base substance.
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申请公布号 |
US2002034916(A1) |
申请公布日期 |
2002.03.21 |
申请号 |
US20010954073 |
申请日期 |
2001.09.18 |
申请人 |
FUSHIMI MASAHIRO;SHIOYA YASUSHI;SHIMIZU YASUSHI |
发明人 |
FUSHIMI MASAHIRO;SHIOYA YASUSHI;SHIMIZU YASUSHI |
分类号 |
H01J9/18;H01J9/24;H01J29/02;H01J29/86;H01J29/87;H01J31/12;(IPC1-7):H01J9/24 |
主分类号 |
H01J9/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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