Exposure apparatus, imaging performance measurement method, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method

摘要

In an exposure apparatus for projecting and exposing a transfer pattern formed on a master onto a substrate placed on a movable stage, a step mark placed on the movable stage and formed from a step is imaged on an image sensing element at an exposure wavelength through a projection optical system, thereby receiving an image. The imaging performance of the projection optical system is calculated on the basis of the resultant image data.