发明名称 Centralized control architecture for a plasma arc system
摘要 The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the "intelligence" of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.
申请公布号 US6359251(B1) 申请公布日期 2002.03.19
申请号 US20000546470 申请日期 2000.04.10
申请人 HYPERTHERM, INC. 发明人 PICARD TATE S.;YOUNG, JR. ROGER E.;WILSON GREGORY S.;HUPPE, JR. RONALD M.
分类号 B23K10/00;(IPC1-7):B23K10/00 主分类号 B23K10/00
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