发明名称 |
Centralized control architecture for a plasma arc system |
摘要 |
The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the "intelligence" of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.
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申请公布号 |
US6359251(B1) |
申请公布日期 |
2002.03.19 |
申请号 |
US20000546470 |
申请日期 |
2000.04.10 |
申请人 |
HYPERTHERM, INC. |
发明人 |
PICARD TATE S.;YOUNG, JR. ROGER E.;WILSON GREGORY S.;HUPPE, JR. RONALD M. |
分类号 |
B23K10/00;(IPC1-7):B23K10/00 |
主分类号 |
B23K10/00 |
代理机构 |
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地址 |
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