| 摘要 |
During a process of manufacturing a spin valve film which produces a large read out signal upon being used as a reading element of a thin film magnetic head, after a completion of a film making process for forming a previous film of two films to be formed successively, but before an initiation of a film making process for forming a succeeding film of the two films, a step of decreasing an anisotropic magnetic field of the spin valve film by interrupting a film making process is introduced. The anisotropic magnetic field reducing step may be performed by keeping a substrate within a sputtering vacuum chamber. A period of the interruption can be shortened by exposing the substrate to a plasma, by transferring the substrate in a separate vacuum chamber whose degree of vacuum is lower than that of the sputtering vacuum chamber or whose H2O or O2 concentration is higher than that in the sputtering vacuum chamber, by conducting a surface treatment with a gas containing H2O or O2 by not less than 1 ppm, or by flowing a process gas.
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