POSITIVE TYPE RESIST COMPOSITION FOR ELECTRON BEAM OR X- RAY

摘要

PROBLEM TO BE SOLVED: To provide a positive type resist composition for electron beams or X-rays which enhances performance in the microfabrication of a semiconductor device using electron beams or X-rays and satisfies such characteristics as sensitivity, resolution and resist shape when electron beams or X-rays are used. SOLUTION: The positive type resist composition contains (A) a resin containing repeating units each having a group capable of generating an acid under electron beams or X-rays as a constitutive component.