| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an array substrate of a liquid crystal display device, etc., which can omit mask patterns for forming channel protective films and an aligning process step for the same and can prevent the occurrence of step cutting at points where signal lines intersect with scanning lines and a method of manufacturing the same. SOLUTION: In first patterning to form the scanning lines 11 and gate electrodes 13, the scanning lines 11 are previously provided with slits 12 in the intersection parts 7 with the signal lines 6. In second patterning to form the channel protective films 22, resist patterns are formed only by the rear surface exposure using the patterns of the scanning lines 11 and the gate electrodes 13 as a mask. On the occasion of this second patterning, wire-shaped protective films 23 are formed on the scanning lines 11 exclusive of the intersection parts 7. In the intersection parts 7, however, the remaining of the wire- shaped protective films 23 is averted by the diffraction of the light through the slit 12 and side etching and therefore there is no occurrence of the level differences which are the case for the step disconnection of the signal lines 6.</p> |
