Semiconductor substrates are contacted with a deionized water solution containing an acidic material.
申请公布号
US6354309(B1)
申请公布日期
2002.03.12
申请号
US20000671730
申请日期
2000.09.29
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
ARNDT RUSSELL H.;GALE GLENN WALTON;KERN, JR. FREDERICK WILLIAM;MADDEN KAREN P.;OKORN-SCHMIDT HARALD F.;OUIMET, JR. GEORGE FRANCIS;SALGADO DARIO;WUTHRICH RYAN WAYNE
