OPERATING METHOD OF LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, DEVICE AND MANUFACTURING METHOD THEREOF

摘要

PURPOSE: A method of operating a lithographic projection apparatus is provided to determine properties of the apparatus and to enable improved imaging to be obtained thereby. CONSTITUTION: A method of operating a lithographic projection apparatus comprises forming a spot of radiation at a wafer level(14) using a pinhole at reticle level. A sensor(16) is defocused with respect to the spot such that it is spaced apart from the wafer level(14). The sensor(16) is scanned beneath the spot to measure the angular intensity distribution of radiation at the spot and to determine the intensity distribution at the pupil plane of a projection lens system(10).