| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treatment liquid for an electronic device so that silicone corrosion power of neutral to alkaline water solution is lowered and removal powers of particle and photoresist residue is not lowered, and furthermore, obstruction of the filter, mixing of metal impurities and aggravation of operation of the device by bubble, do not occur. SOLUTION: An aliphatic and polycyclic surfactant is added to the water solution for treatment of the electron device surface which contains at least one among quaternary ammonium, ammonia, ammonium phosphate and condensed ammonium phosphate.
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