发明名称 |
APPARATUS FOR PLANARIZING INSULATION LAYER OF MULTILAYERED SUBSTRATE |
摘要 |
PURPOSE: An apparatus for planarizing an insulation layer of a multilayered substrate is provided to omit an additional process by minimizing the roughness of the substrate, and to improve reliability by minimizing an open or short circuit caused by the roughness. CONSTITUTION: An insulation layer(120) is stacked on the upper and lower portions of a CCL(110) of the multilayered substrate where an inner layer circuit pattern(100) is built as one body. A press unit(150) presses the insulation layer of the multilayered substrate so that the insulation layer is planarized. A planar plate of a stainless material is built as one body by interposing a cushion sheet on a part of a press plate(160).
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申请公布号 |
KR20020017655(A) |
申请公布日期 |
2002.03.07 |
申请号 |
KR20000051138 |
申请日期 |
2000.08.31 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
HWANG, SE MYEONG |
分类号 |
H01L21/3105;(IPC1-7):H01L21/310 |
主分类号 |
H01L21/3105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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