发明名称 Etching device
摘要 An etching device for supplying an etchant to the surface of a workpiece held on a rotating spinner table, which comprises a center portion supply nozzle for supplying the etchant to the rotation center portion of the workpiece held on the spinner table and a peripheral portion supply nozzle for supplying the etchant to an area between the rotation center portion and the periphery of the workpiece.
申请公布号 US2002026985(A1) 申请公布日期 2002.03.07
申请号 US20010925704 申请日期 2001.08.10
申请人 KAI KENYA 发明人 KAI KENYA
分类号 C23F1/08;H01L21/00;H01L21/306;(IPC1-7):C23F1/02 主分类号 C23F1/08
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