| 摘要 |
A method of fabricating a grating in a planar optical device by fabricating a surface grating or by photoinscription. For surface gratings, a method comprises providing a substrate material that includes a substrate layer, a first core layer, a second core layer, and a first photoresist layer. An exposure of a grating and a plurality of alignment marks is formed onto the substrate material. The second core layer is etched to form the grating in the second core layer. A second photoresist layer is deposited on the substrate material that remains after the first etching. An exposure of a waveguide pattern is formed in the first core layer. The first core layer is etched to define a first waveguide in the first core layer, where the first waveguide includes a first portion having the surface grating. For photoinscription, the fabrication method comprises providing a substrate material that includes a substrate layer, a core layer, and a first photoresist layer. A first photo-mask that includes a plurality of alignment marks is disposed between the first photoresist and a light source. An exposure of the first photo-mask is performed and the alignment marks are etched into the core layer. A grating is written into the core layer by a photosensitive effect. A second photoresist layer is deposited on the substrate material and an exposure of a waveguide pattern is formed in the core layer. The core layer is etched to define a first waveguide in the core layer, where the first waveguide includes a first portion having the surface grating
|
