发明名称 COLD CATHODE ION BEAM DEPOSITION APPARATUS WITH SEGREGATED GAS FLOW
摘要 A cold cathode closed drift ion source is provided with segregated gas flow. The first gas may be caused to flow through or along a path around a peripheral portion of the anode so as to pass through the electric gap between the anode and cathode. A second gas (different form the first gas) may be caused to flow toward the ion emitting slit, without much of the second gas having to pass through the electric gap(s). It if is desired to utilize a gas which produces insulative material (e.g., an organosilicon gas), this gas may be used as the second gas. Accordingly, insulative material build-up in the electric gap between the anode and cathode may be reduced, and changes in beam chemistry can be achieved without unduly altering ion beam characteristics.
申请公布号 WO0219366(A2) 申请公布日期 2002.03.07
申请号 WO2001US26588 申请日期 2001.08.27
申请人 GUARDIAN INDUSTRIES CORPORATION;PETRMICHL, RUDOLPH, H. 发明人 PETRMICHL, RUDOLPH, H.
分类号 C23C14/22;C23C16/44;C23C16/455;C23C16/513;H01J27/14;H01J37/08;H01J37/317 主分类号 C23C14/22
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