发明名称 |
APPARATUS FOR PROCESSING THIN PLATE |
摘要 |
PURPOSE: An apparatus for processing a thin plate is provided to improve efficiency of a fabricating process by simplifying a structure of a transporting portion. CONSTITUTION: A rotary etching apparatus(1) is formed with a vessel, a rotating shaft(4), the first nozzle member, the second nozzle member, and a support(5). The second nozzle portion is arranged on an upper portion of the second nozzle portion. The vessel is formed with a vessel body(2) fixed to a frame(15) and a cover. The support(5) is used for fixing a semiconductor wafer. The rotating shaft(4) is a hollow shaft. The rotating shaft(4) is used for transferring a rotary power of a rotating shaft drive portion(26) to the support(5). The first nozzle portion is formed with a conduit for supplying treatment fluid(8) and the first nozzles(19). The support(5) has a multitude of holders(6).
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申请公布号 |
KR20020017401(A) |
申请公布日期 |
2002.03.07 |
申请号 |
KR20000050730 |
申请日期 |
2000.08.30 |
申请人 |
DNS KOREA CO., LTD. |
发明人 |
AHN, DU GEUN;BANG, IN HO;KOO, GYO UK |
分类号 |
H01L21/306;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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