| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and system for exposure by which the throughput of an exposure system group is improved by shortening the waiting time of each exposure system by making the substrate to be exposed of a semiconductor device, etc., which is constituted of a plurality of layers of circuit patterns and requires strict superimposing accuracy exposable by performing little preceding exposing work by using a plurality of different exposure systems. SOLUTION: The overlay error between exposure systems due to the difference between the systems is calculated by eliminating the influence of the difference between the systems from the previously acquired performance information of the systems or past measured overlay values. In addition, the overlay error between patterns formed in a semiconductor device is calculated from past measured overlay values. Then the overlay correcting value which is used at the time of exposing the semiconductor device in an exposing step is calculated from the overlay error due to the difference between the exposure systems and the overlay error between the patterns formed in the semiconductor device.
|
