METHOD FOR PRODUCING PHOTOMASK, METHOD FOR PRODUCING PHOTOMASK BLANK AND METHOD FOR REGENERATING PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To reutilize a photomask. SOLUTION: A light shielding pattern 3a comprising a resist film formed on a photomask M1a is removed and a new light shielding pattern comprising a resist film is formed again on the photomask M1a to regenerate the photomask. A light shielding pattern comprising a resist film formed in the integrated circuit pattern region of a mask with a light shielding pattern comprising a metal formed in the peripheral region is removed and a new light shielding pattern comprising a resist film is formed again in the integrated circuit pattern region of the mask to regenerate the mask.