METHOD AND DEVICE FOR DEPOSITING A PRECURSOR ON A SUBSTRATE, SAID PRECURSOR BEING PRESENT IN LIQUID FORM

摘要

Disclosed is a device for depositing at least one precursor (6') on at least one substrate, said precursor being present in liquid or dissolved form. The inventive device comprises at least one storage container (6) for the individual or mixed precursor(s) and a reaction chamber (1) in which the substrate(s) is/are arranged, the layers being placed on said substrate(s). The inventive device also comprises a conveying device (8) that conveys the precursor(s) from the storage container(s) to the area by means of at least one line, whereby the precursor(s) are vaporised in said area. Said device further comprises a control unit which controls the conveying device (8). The invention is characterised in that a sensor unit (41, 42) is provided which detects the amount of the supplied precursors and has an output signal that is applied to the control unit as a real signal. The control unit controls the conveying device in such a way that the mass flow pertaining to the precursors has a mean predetermined value during a given time period.