Structure of borderless contact and fabricating method thereof

摘要

An improved borderless contact structure and method of making the structure including a substrate with side walls formed on the side of the shallow trench. An insulator is formed over the side walls and in the remainder of the trench such that the insulator extends above an upper surface of the substrate. The side walls are formed of a first etch selection type and the insulator is formed of a second etch selection type.