| 摘要 |
<p>New photoacid generator compounds ('PAGs') are provided and photoresist compositions that comprise such compounds. In particular, non-ionic PAGs are provided that contain an oxime sulfonate group, and/or an N-oxyimidosulfonate group. PAGs of the invention are particularly useful as photoactive components of photoresists imaged at short wavelenghts such as 248 nm, 193 nm and 157 nm.</p> |
