发明名称 |
DEVICE SIMULATION APPARATUS, ITS METHOD, AND RECORDING MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To allow efficient mesh setting with less number of meshes by accurately reflecting a shape calculation result of process simulation on a device simulation structure definition. SOLUTION: Based on the result of process simulation, a position information about such position as of large dopant concentration ratio at a material interface position, PN junction position, and adjoining mesh point is searched with a search start position and its direction specified. The acquired position information is used for dividing a mesh used for device simulation.
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申请公布号 |
JP2002064198(A) |
申请公布日期 |
2002.02.28 |
申请号 |
JP20000247520 |
申请日期 |
2000.08.17 |
申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC |
发明人 |
HAYASHI YOICHI |
分类号 |
H01L21/66;G06F17/50;H01L21/00;H01L21/336;H01L29/00;H01L29/78;(IPC1-7):H01L29/00 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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