发明名称 DEVICE SIMULATION APPARATUS, ITS METHOD, AND RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To allow efficient mesh setting with less number of meshes by accurately reflecting a shape calculation result of process simulation on a device simulation structure definition. SOLUTION: Based on the result of process simulation, a position information about such position as of large dopant concentration ratio at a material interface position, PN junction position, and adjoining mesh point is searched with a search start position and its direction specified. The acquired position information is used for dividing a mesh used for device simulation.
申请公布号 JP2002064198(A) 申请公布日期 2002.02.28
申请号 JP20000247520 申请日期 2000.08.17
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 HAYASHI YOICHI
分类号 H01L21/66;G06F17/50;H01L21/00;H01L21/336;H01L29/00;H01L29/78;(IPC1-7):H01L29/00 主分类号 H01L21/66
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