发明名称 Projection optical system and projection exposure apparatus
摘要 Disclosed is a projection optical system for projecting an image of an object onto an image plane, which includes a first imaging optical system for forming an image of the object, a second imaging optical system for re-imaging the image upon the image plane, wherein the first and second imaging optical systems are disposed in an order from the object side and are disposed along a common straight optical axis, wherein the first imaging optical system includes a first mirror for reflecting and collecting abaxial light from the object, wherein one of the first and second imaging optical systems includes a second mirror for reflecting light from the first mirror to the image plane side, and wherein, with the second mirror, the abaxial light is caused to pass an outside of an effective diameter of the first mirror.
申请公布号 US2002024741(A1) 申请公布日期 2002.02.28
申请号 US20010784021 申请日期 2001.02.16
申请人 TERASAWA CHIAKI;ISHII HIROYUKI;KATO TAKASHI 发明人 TERASAWA CHIAKI;ISHII HIROYUKI;KATO TAKASHI
分类号 G02B13/18;G02B17/08;G03F7/20;H01L21/027;(IPC1-7):G02B27/10;G02B27/14 主分类号 G02B13/18
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