| 发明名称 |
Processing system for substrate |
| 摘要 |
<p>A processing system for an object to be processed has a housing defining a closed space. The housing is provided with an opening through which an airtight carrying box is carried in and carried out. The carrying box hermetically contains the object to be processed. A lid operating mechanism for opening and closing the lid of the carrying box is disposed near the opening. A contamination preventing duct covers a space around the lid of the carrying box and supplies a clean gas of a high cleanliness therein at least when the lid of the carrying box is opened.</p> |
| 申请公布号 |
EP1182694(A2) |
申请公布日期 |
2002.02.27 |
| 申请号 |
EP20010203172 |
申请日期 |
2001.08.23 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SAKATA, KAZUNARI;TAKEUCHI, YASUSHI |
| 分类号 |
H01L21/68;B65G49/07;H01L21/00;H01L21/673;H01L21/677;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/68 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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