| 摘要 |
PURPOSE: A substrate cleaning apparatus is provided to reduce an operation time required for removing foreign matters, to enhance operation efficiency, to stably and reliably remove the foreign matters, and to restrain operation time even if the size of the substrate increases. CONSTITUTION: A substrate cleaning apparatus includes one sheet roll(8) wound with one end of a polishing sheet(9) arranged to be in contact with the surface of a liquid crystal panel(20), and the other sheet roll for rolling up the polishing sheet from the other end. The substrate cleaning apparatus further includes a rotating unit having a motor(1), a belt(4), and a rotation shaft(5) for rotating the polishing sheet and the pair of sheet rolls with respect to the liquid crystal panel. With the substrate cleaning apparatus, an operation time required for removing foreign matters is reduced. Moreover, operation efficiency is enhanced, the foreign matters are removed stably and reliably, and operation time is restrained even if the size of the substrate increases.
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