| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor wafer washing device with which a semiconductor wafer can be washed with clean and highly concentrated ozone water since metal powder or the like from an ozone generator is not mixed with a material water by generating ozone water without bringing water and ozone into directly contact and generating highly concentrated ozone water efficiently. SOLUTION: Material water and ozone gas are isolated by a nonporous ozone gas permeating polymer film, which permeates only gases and blocks permeation of fluids. Ozone water is generated by blending the ozone gas into the material water through the ozone gas permeating film. In a semiconductor wafer washing device having this system, the ozone is supplied to the ozone gas permeating film in a state generated and pressurized by an ozone generator.
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