发明名称 |
METHOD AND APPARATUS FOR IMPROVING FILM DEPOSITION UNIFORMITY ON A SUBSTRATE |
摘要 |
A method and apparatus for depositing a film on a substrate. According to the present invention a prewafer reaction layer is deposited onto a susceptor placed in the reaction chamber to form a prewafer reaction layer coated susceptor prior to film deposition. A deposition gas is then fed into the reaction chamber so that it flows over the prewafer reaction layer coated susceptor and the substrate to form a film on the prewafer reaction layer coated susceptor and the substrate.
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申请公布号 |
US2002020358(A1) |
申请公布日期 |
2002.02.21 |
申请号 |
US19990438696 |
申请日期 |
1999.11.11 |
申请人 |
HEY H. PETER W.;ACHUTHARAMAN VEDAPURAM S.;SWENBERG JOHANES F. N. |
发明人 |
HEY H. PETER W.;ACHUTHARAMAN VEDAPURAM S.;SWENBERG JOHANES F. N. |
分类号 |
C23C16/44;H01L21/205;H01L21/285;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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