| 摘要 |
PURPOSE: To provide a liquid treatment device and a liquid treatment method which can give a high quality substrate stuck with a smaller amount of particles by reducing the generation of mist in a spinner-type liquid treatment device. CONSTITUTION: The liquid treatment device is provided with a holding means (a spin chuck) 41 holding a substrate G on it, a treating liquid supply means supplying a specified treating liquid to the substrate G, a rotation driving mechanism 42 which rotates the substrate G with the spin chuck 41 in a plane, a treating cup unit 49 having an outer cup 48 the inner wall of which is in a nearly dried state in the beginning of a spin-drying treatment of the substitute G, and which is arranged to enclose the substrate G for the use in the stage of the spin-drying treatment, and a lifting mechanism 50 for the treatment cup unit 49.
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