METHOD FOR ETCHING FUSE CUTTING HOLE

摘要

PURPOSE: A method for etching a fuse cutting hole is provided to simplify a manufacturing process by continuously etching an insulation layer and a polysilicon layer in an etch apparatus by an in-situ method, and to uniformly maintain the thickness of the insulation layer left on a fuse by using the polysilicon layer as an etch stop layer. CONSTITUTION: A plurality of insulation layers on a bit line fuse cutting hole are selectively etched in the apparatus for etching the insulation layer by using a plate polysilicon layer(112) as an etch stop layer. The plate polysilicon layer exposed by etching the insulation layer in the etch apparatus is etched.