发明名称 BARREL ELECTROPLATING METHOD FOR EXTREMELY SMALL ARTICLES
摘要 PROBLEM TO BE SOLVED: To improve the deposition speed of plating film and to improve the productivity by making the thicknesses of the plating films formed in required sections uniform, thereby improving the non-defective fraction in a barrel electroplating of articles to be plated of extremely small dimensions. SOLUTION: The many extremely small articles X to be plated of 5 to 500μm in average grain size are housed in a barrel 52 having many small openings of 3 to 300μm in diameter and while the barrel is moved in a plating bath 14, voltage is impressed between a cathode member 54 arranged contactably with the articles X to be plated and anode electrodes 56 arranged in the plating bath 14 to form the plating films on the surfaces of the articles to be plated. Vibrating vanes 16f fixed to a vibrating rod 16e vibrated within the plating bath 14 cooperatively with a vibration generating means 16d are vibrated at amplitude 0.1 to 10.0 mm and a number of vibrations of 200 to 800 times/min, thereby, a vibrating flow is generated in the plating bath and the barrel is vibrated at the amplitude 0.1 to 5.0 mm and the number of vibrations of 100 to 300 times/min.
申请公布号 JP2002053999(A) 申请公布日期 2002.02.19
申请号 JP20000239164 申请日期 2000.08.07
申请人 NIPPON TECHNO KK 发明人 OMASA TATSUAKI
分类号 C25D7/00;C25D17/20;(IPC1-7):C25D17/20 主分类号 C25D7/00
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