VAPOR PHASE GROWTH METHOD, VAPOR PHASE GROWTH APPARATUS AND VAPORIZER FOR VAPOR PHASE GROWTH APPARATUS

摘要

PROBLEM TO BE SOLVED: To effectively prevent the accumulation of a reaction product with an organometallic complex as a precursor on a vaporizer or a duct line on the downstream side therefrom at a low cost without damaging the stability of the process. SOLUTION: When the vaporization of an organometallic complex Cu (hfac) TMVS is not performed by a vaporizer 2, to the inside of the gas region Av of the vaporizer 2 or the inside of piping 14 connected to a vaporizer 1 on the downstream side therefrom, a stabilizer TMVS with respect to the organometallic complex is supplied in a gas state.