| 发明名称 |
RIE etch resistant nonchemically amplified resist composition and use thereof |
| 摘要 |
Photoresist compositions of improved reactive ion etching comprising polymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkylacrylate and a titanate, zirconate and/or hafnate are provided. The photoresist compositions are used for forming positive lithographic patterns.
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| 申请公布号 |
US6348299(B1) |
申请公布日期 |
2002.02.19 |
| 申请号 |
US19990351428 |
申请日期 |
1999.07.12 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
AVIRAM ARI;BABICH INNA V. |
| 分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03C5/16 |
主分类号 |
G03F7/004 |
| 代理机构 |
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